Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Qi Fang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Qi Fang returned 4 record(s).

NumberTitle
1Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
2Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
3Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
4A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films