Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
Info:
Electrochemical and Solid-State Letters, 7 (5) F31-F34 (2004)
Author Information
| Name |
Institution |
| Woong-Chul Shin | Electronics and Telecommunication Research Institute, (ETRI) |
| Sang-Ouk Ryu | Electronics and Telecommunication Research Institute, (ETRI) |
| In-Kyu You | Electronics and Telecommunication Research Institute, (ETRI) |
| Sung-Min Yoon | Electronics and Telecommunication Research Institute, (ETRI) |
| S. M. Cho | Electronics and Telecommunication Research Institute, (ETRI) |
| N. Y. Lee | Electronics and Telecommunication Research Institute, (ETRI) |
| K. D. Kim | Electronics and Telecommunication Research Institute, (ETRI) |
| Byoung-Gon Yu | Electronics and Telecommunication Research Institute, (ETRI) |
| Won-Jae Lee | Dong-Eui University |
| Kyu-Jeong Choi | Chungnam National University |
| Soon-Gil Yoon | Chungnam National University |
Films
Film/Plasma Properties
Analysis: XRD, X-Ray Diffraction
Analysis: TEM, Transmission Electron Microscope
Analysis: AFM, Atomic Force Microscopy
Analysis: AES, Auger Electron Spectroscopy
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: Ferroelectrical Testing
Analysis: I-V, Current-Voltage Measurements
Substrates
Notes