About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide

Type:
Journal
Info:
Journal of Astronomical Telescopes, Instruments, and Systems 1(4), 044002 (2015)
Date:
2015-08-27

Author Information

Name Institution
David M. FryaufUniversity of California - Santa Cruz
Andrew C. PhillipsUniversity of California - Santa Cruz
Nobuhiko P. KobayashiUniversity of California Observatories

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Reflectivity
Analysis: Reflectometry

Characteristic: Environmental Testing
Analysis: Environmental Testing

Substrates

Al2O3
Ta2O5

Notes

439