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XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films

Type:
Journal
Info:
2019 Semicond. Sci. Technol. 34, 034004
Date:
2018-11-09
DOI:
http://dx.doi.org/10.1088/1361-6641/aaef9f

Author Information

Name Institution
V.S. PatilNorth Maharashtra University
K.S. AgrawalNorth Maharashtra University
Viral BarhateNorth Maharashtra University
V.S. PatilNorth Maharashtra University
A.M. MahajanNorth Maharashtra University

Films

Plasma La2O3

Hardware used: Custom
LaCp3, Tris(cyclopentadienyl) lanthanum
CAS#: 1272-23-7
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Plasma ZrO2

Hardware used: Custom
TEMAZr, (EtMeN)4Zr, [(C2H5)(CH3)N]4Zr, Tetrakis(EthylMethylAmido) Zirconium, Zirconium Ethylmethylamide
CAS#: 175923-04-3
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: SENTECH SE800

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: ULVAC PHI Inc., PHI 700

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Substrates

Si(100)

Notes

1482