Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

LaCp3, Tris(cyclopentadienyl) lanthanum, CAS# 1272-23-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films