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Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits

Type:
Journal
Info:
Journal of Applied Physics 100, 073512 (2006)
Date:
2006-06-16
DOI:
http://dx.doi.org/10.1063/1.2349477

Author Information

Name Institution
Trinh Tu VanUniversity of California - Los Angeles (UCLA)
J. HoangUniversity of California - Los Angeles (UCLA)
R. OstroumovUniversity of California - Los Angeles (UCLA)
K. L. WangUniversity of California - Los Angeles (UCLA)
John R. BargarSLAC National Accelerator Laboratory
J. LuUppsala University
H.-O. BlomUppsala University
Jane P. ChangUniversity of California - Los Angeles (UCLA)

Films

Plasma Er:Y2O3

Hardware used: Custom Microwave Plasma
Er(TMHD)3, Er(THD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) erbium, Erbium dipivaloylmethanate
CAS#: 35733-23-4
tris(2,2,6,6-tetramethyl-3,5-heptanedionato) yttrium Y(tmhd)3
CAS#: 15632-39-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 350C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: VG ESCALAB 5

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: PHI RBS-400

Characteristic: Microstructure
Analysis: EXAFS, Extended X-ray Absorption Fine Structure
Diagnostic: Synchrotron

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy
Diagnostic: FEI Tecnai F30ST

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Diagnostic: Custom

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Diagnostic: -

Substrates

Si(100)

Notes

1315