Er(TMHD)₃, Er(THD)₃, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) erbium, Erbium dipivaloylmethanate, CAS# 35733-23-4

Your search for publications using this chemistry returned 8 record(s).

Number	Title
1	Radical-enhanced atomic layer deposition of Y₂O₃ via a beta-diketonate precursor and O radicals
2	Er coordination in Y₂O₃ thin films studied by extended x-ray absorption fine structure
3	Controlled erbium incorporation and photoluminescence of Er-doped Y₂O₃
4	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al₂O₃ for Photoluminescence Enhancement
5	Nanostructure and temperature-dependent photoluminescence of Er-doped Y₂O₃ thin films for micro-optoelectronic integrated circuits
6	Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
7	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al₂O₃ for Photoluminescence Enhancement
8	Optical properties of Y₂O₃ thin films doped with spatially controlled Er³⁺ by atomic layer deposition

Er(TMHD)3, Er(THD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) erbium, Erbium dipivaloylmethanate, CAS# 35733-23-4