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Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition

Type:
Journal
Info:
Journal of Applied Physics 101, 123116 (2007)
Date:
2007-05-04

Author Information

Name Institution
J. HoangUniversity of California - Los Angeles (UCLA)
Trinh Tu VanUniversity of California - Los Angeles (UCLA)
M. Sawkar-MathurUniversity of California - Los Angeles (UCLA)
Bram HoexEindhoven University of Technology
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
R. OstroumovUniversity of California - Los Angeles (UCLA)
K. L. WangUniversity of California - Los Angeles (UCLA)
John R. BargarSLAC National Accelerator Laboratory
Jane P. ChangUniversity of California - Los Angeles (UCLA)

Films


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Optical Properties
Analysis: EXAFS, Extended X-ray Absorption Fine Structure

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence

Characteristic: Optical Absorption
Analysis: CRDS, Cavity Ring-Down Spectroscopy

Characteristic: Optical Absorption
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Substrates

Hereaus Suprasil 300
SiO2

Notes

1327