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Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers

Type:
Journal
Info:
Plasma Processes and Polymers, 13(3), 311-315
Date:
2015-08-17
DOI:
http://dx.doi.org/10.1002/ppap.201500096

Author Information

Name Institution
Sergey A. StarostinDutch Institute For Fundamental Energy Research (DIFFER)
Wytze KeuningEindhoven University of Technology
Jean-Paul SchalkenEindhoven University of Technology
Mariadriana CreatoreEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Jan B. BouwstraFUJIFILM Manufacturing Europe B.V.
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology
Hindrik W. de VriesDutch Institute For Fundamental Energy Research (DIFFER)

Films

Plasma Al2O3

Hardware used: Oxford Instruments FlexAL
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 80C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Water Vapor Transmission Rate (WVTR)
Diagnostic: Technolox Deltaperm

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Park Systems, NX10

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test
Diagnostic: Custom

Substrates

PEN, Polyethylene Napthalate
SiO2
Silicon
Calcium

Notes

537