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ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

Type:
Journal
Info:
ECS Journal of Solid State Science and Technology, 3 (3) N39-N45 (2014)
Date:
2014-01-06
DOI:
http://dx.doi.org/10.1149/2.012403jss

Author Information

Name Institution
A. SalaünCEA - LETI MINATEC
M. VeillerotCEA - LETI MINATEC
F. PierreCEA - LETI MINATEC
E. SouchierCEA - LETI MINATEC
V. JousseaumeCEA - LETI MINATEC

Films

Plasma ZrO2

Hardware used: ASM EmerALD
Tris(dimethylamino)cyclopentadienyl Zirconium, CpZr(NMe2)3, Air Liquide ZyALDTM
CAS#: 33271-88-4
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 200-300C

Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Diagnostic: PANalytical Xpert PRO MPD X-ray Diffractometer

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Jordan Valley JVX 5200

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Jordan Valley JVX 5200

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon

Characteristic: Band Gap
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon

Characteristic: Chemical Composition, Impurities
Analysis: ATR-FTIR
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Bruker Dimension 5

Characteristic: Chemical Composition, Impurities
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry
Diagnostic: ION TOF TofSIMS 5

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: Van de Graaff ion accelerator of CENBG

Characteristic: Chemical Composition, Impurities
Analysis: nRBS, nonRutherford Back Scattering
Diagnostic: Van de Graaff ion accelerator of CENBG

Characteristic: Chemical Composition, Impurities
Analysis: NRA, Nuclear Reaction Analysis
Diagnostic: Van de Graaff ion accelerator of CENBG

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Diagnostic: Keithley 2635 Source Meter

Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements
Diagnostic: Keithley 2635 Source Meter

Substrates

TiN

Notes

PEALD ZrO2 film development with Air Liquid ZyALD precursor.
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