ASM EmerALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM EmerALD hardware returned 12 records.

Number	Title
1	ZrO₂ Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
2	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
3	Evaluation of plasma parameters on PEALD deposited TaCN
4	Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
5	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al₂O₃
6	Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
7	Tribological properties of thin films made by atomic layer deposition sliding against silicon
8	Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
9	PEALD ZrO₂ Films Deposition on TiN and Si Substrates
10	Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
11	Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
12	Interface and plasma damage analysis of PEALD TaCN deposited on HfO₂ for advanced CMOS studied by angle resolved XPS and C-V