Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
Type:
Journal
Info:
Nano-Micro Lett. (2017) 9: 29
Date:
2017-01-10
Author Information
| Name | Institution |
|---|---|
| Dainan Zhang | University of Electronic Science and Technology of China |
| Tian-Long Wen | University of Electronic Science and Technology of China |
| Ying Xiong | University of Electronic Science and Technology of China |
| Donghong Qiu | University of Electronic Science and Technology of China |
| Qi-Ye Wen | University of Electronic Science and Technology of China |
Films
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Si(001) |
Notes
| 987 |