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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

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Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells

Type:

Conference Proceedings

Info:

2016 IEEE 43rd Photovoltaic Specialists Conference (PVSC)

Date:

2016-06-05

DOI:

http://dx.doi.org/10.1109/PVSC.2016.7750215

Author Information

Name	Institution
Woojun Yoon	U.S. Naval Research Laboratory
Anthony Lochtefeld	AmberWave Inc.
Nicole Kotulak	U.S. Naval Research Laboratory
David Scheiman	U.S. Naval Research Laboratory
Allen Barnett	University of New South Wales
Phillip Jenkins	U.S. Naval Research Laboratory
Robert Walters	U.S. Naval Research Laboratory