Patterned deposition by plasma enhanced spatial atomic layer deposition
Type:
Journal
Info:
physica status solidi (RRL) - Rapid Research Letters Volume 5, Issue 4, pages 165--167, 2011
Date:
2011-03-29
Author Information
| Name | Institution |
|---|---|
| Paul Poodt | TNO |
| Bas Kniknie | TNO |
| Annalisa Branca | TNO |
| Hans Winands | TNO |
| Fred Roozeboom | TNO |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
| Si(100) |
Notes
| 692 |