Fred Roozeboom Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Fred Roozeboom returned 29 record(s).

Number	Title
1	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
2	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
3	Patterned deposition by plasma enhanced spatial atomic layer deposition
4	Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
5	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
6	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
7	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
8	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
9	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
10	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
11	Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
12	Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
13	Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
14	Anti-stiction coating for mechanically tunable photonic crystal devices
15	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
16	Encapsulation method for atom probe tomography analysis of nanoparticles
17	Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
18	Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
19	Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
20	Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
21	Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
22	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
23	Atmospheric pressure plasma enhanced spatial ALD of silver
24	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
25	Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
26	Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
27	Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
28	Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
29	Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry