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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

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Anti-stiction coating for mechanically tunable photonic crystal devices

Type:
Journal
Info:
Optics Express, v. 26, n. 4, p. 3882--3891 (2018)
Date:
2018-01-18

Author Information

Name Institution
M. PetruzzellaEindhoven University of Technology
Z. ZobenicaEindhoven University of Technology
M. CotrufoEindhoven University of Technology
Valerio ZardettoEindhoven University of Technology
Alfredo MameliEindhoven University of Technology
F. PaglianoEindhoven University of Technology
S. KoellingEindhoven University of Technology
F. W. M. van OttenEindhoven University of Technology
Fred RoozeboomEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
R. W. van der HeijdenEindhoven University of Technology
A. FioreEindhoven University of Technology

Films

Plasma Al2O3


Film/Plasma Properties

Substrates

Notes

1202