Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
Info:
Proc. SPIE 10691, Advances in Optical Thin Films VI, 106910E (5 June 2018)
Author Information
Films
Film/Plasma Properties
Analysis: Spectrophotometry
Analysis: Spectrophotometry
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: XRR, X-Ray Reflectivity
Analysis: XRR, X-Ray Reflectivity
Analysis: XRR, X-Ray Reflectivity
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Analysis: Wafer Curvature
Analysis: AFM, Atomic Force Microscopy
Substrates
Notes