Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
Type:
Journal
Info:
Proc. SPIE 10691, Advances in Optical Thin Films VI, 106910E (5 June 2018)
Date:
2018-06-05
Author Information
| Name | Institution |
|---|---|
| Vivek Beladiya | Friedrich-Schiller-Universität Jena |
| Tahsin Faraz | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Andreas Tünnermann | Friedrich-Schiller-Universität Jena |
| Adriana Szeghalmi | Friedrich-Schiller-Universität Jena |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Transmittance
Analysis: Spectrophotometry
Characteristic: Reflectance Spectra
Analysis: Spectrophotometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Stress
Analysis: Wafer Curvature
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Etch Rate
Analysis: Custom
Substrates
| SiO2 |
| Glass, BK7 |
Notes
| 1274 |