About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center

Type:

Journal

Info:

Progress in Photovoltaics: Research and Applications, 2016

Date:

2015-11-18

DOI:

http://dx.doi.org/10.1002/pip.2731

Author Information

Name	Institution
Dominic C. Walter	Institute for Solar Energy Research Hamelin (ISFH)
Bianca Lim	Institute for Solar Energy Research Hamelin (ISFH)
Jan Schmidt	Institute for Solar Energy Research Hamelin (ISFH)