About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor

Type:
Conference Proceedings
Info:
2016 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)
Date:
2016-07-06
DOI:
http://dx.doi.org/10.1109/AM-FPD.2016.7543668

Author Information

Name Institution
Taiyu JinKorea Advanced Institute of Science and Technology
Jeongjae RyuKorea Advanced Institute of Science and Technology
HanSaem KangLG Display Co. Ltd.
Kwangsoo NoKorea Advanced Institute of Science and Technology
Sang-Hee Ko ParkKorea Advanced Institute of Science and Technology

Films

Plasma Al2O3

Hardware used: Unknown
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

IGZO

Notes

952