Tert-Butylimido,Tris(diMEthylamino)Tantalum, Ta[N(CH3)2]3[=NC(CH3)3], TBTMET, TBTDMT, CAS# 69039-11-8

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s).

NumberTitle
1Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
2Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
3Topographically selective deposition
4Trilayer Tunnel Selectors for Memristor Memory Cells
5Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
6Trilayer Tunnel Selectors for Memristor Memory Cells
7Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD

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