About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

New grating concepts in the NIR and SWIR spectral band for high resolution earth-observation spectrometers

Type:
Conference Proceedings
Info:
Proc. SPIE 9912, Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation II
Date:
2016-06-26
DOI:
http://dx.doi.org/10.1117/12.2232538

Author Information

Name Institution
T. Flügel-PaulFraunhofer Institute for Applied Optics and Precision Engineering
G. KalkowskiFraunhofer Institute for Applied Optics and Precision Engineering
T. BenkensteinFraunhofer Institute for Applied Optics and Precision Engineering
T. HarzendorfFraunhofer Institute for Applied Optics and Precision Engineering
A. MatthesFraunhofer Institute for Applied Optics and Precision Engineering
U. D. ZeitnerFraunhofer Institute for Applied Optics and Precision Engineering

Films

Plasma TiO2

Hardware used: Unknown
Deposition Temperature Range = 100-120C

Plasma Al2O3

Hardware used: Unknown
Deposition Temperature Range = 100-120C

Film/Plasma Properties

Substrates

SiO2

Notes

832