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Plasma Enhanced Atomic Layer Deposition on Powders

Type:
Conference Proceedings
Info:
ECS Trans. 2014 volume 64, issue 9, 51-62
Date:
2014-10-06
DOI:
http://dx.doi.org/10.1149/06409.0051ecst

Author Information

Name Institution
Geert RampelbergGhent University

Films

Thermal Al2O3

Hardware used: Custom Rotary
Deposition Temperature Range N/A

Thermal TiO2

Hardware used: Custom Rotary
Deposition Temperature Range N/A

Plasma AlN

Hardware used: Custom Rotary
Deposition Temperature Range N/A

Plasma TiN

Hardware used: Custom Rotary
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Diagnostic: -

Characteristic: Gas Phase Species
Analysis: OES, Optical Emission Spectroscopy
Diagnostic: -

Characteristic: Thickness
Analysis: XRF, X-Ray Fluorescence
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Substrates

ZnO

Notes

(PE)ALD of Al2O3, TiO2, AlN, and TiN on powders with custom rotary system.
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