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Theoretical and Experimental Investigation of Graphene/High-κ/p-Si Junctions

Type:
Journal
Info:
IEEE ELECTRON DEVICE LETTERS, VOL. 37, NO. 1, PP. 4-7, 2016
Date:
2015-11-04
DOI:
http://dx.doi.org/10.1109/LED.2015.2497714

Author Information

Name Institution
Jaewoo ShimSungkyunkwan University
Gwangwe YooSungkyunkwan University
Dong-Ho KangSungkyunkwan University
Woo-Shik JungSungkyunkwan University
Young-Chul ByunSungkyunkwan University
Hyoungsub KimSungkyunkwan University
Won Tae KangSungkyunkwan University
Woo Jong YuSungkyunkwan University
Hyun-Yong YuSungkyunkwan University
Yongkook ParkSungkyunkwan University
Jin-Hong ParkSungkyunkwan University

Films

Plasma Al2O3

Hardware used: Unknown
Deposition Temperature Range N/A

Plasma TiO2

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

544