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DIBL in enhanced dynamic threshold operation of UTBB SOI with different drain engineering at high temperatures

Type:
Conference Proceedings
Info:
2016 31st Symposium on Microelectronics Technology and Devices (SBMicro)
Date:
2016-08-29
DOI:
http://dx.doi.org/10.1109/SBMicro.2016.7731329

Author Information

Name Institution
K.R.A. SasakiUniversity of Sao Paulo
Eddy SimoenIMEC
Cor ClaeysIMEC
Joao Antonio MartinoUniversity of Sao Paulo

Films

Plasma TiN

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

SiO2

Notes

925