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Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride

Type:
Journal
Info:
J. Mater. Chem. A, 2016, 4, 14008-14016
Date:
2016-08-18
DOI:
http://dx.doi.org/10.1039/C6TA05200B

Author Information

Name Institution
Sung Kyu ChoiKyungpook National University
Weon-Sik ChaeKorean Basic Science Institute
Bokyung SongDaegu Gyeongbuk Institute of Science & Technology
Chang-Hee ChoDaegu Gyeongbuk Institute of Science & Technology
Jina ChoiKorea Research Institute of Chemical Technology
Dong-Suk HanTexas A&M University at Qatar
Wonyong ChoiPohang University of Science and Technology (POSTECH)
Hyunwoong ParkKyungpook National University

Films

Plasma TiN

Hardware used: Quros Plus 200
TEMATi, (EtMeN)4Ti, [(C2H5)(CH3)N]4Ti, Tetrakis(EthylMethylAmido) Titanium, Titanium Ethylmethylamide
CAS#: 308103-54-0
NH3, Ammonia
CAS#: 7664-41-7
Deposition Temperature = 230C

Film/Plasma Properties

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Diagnostic: -

Characteristic: Unknown
Analysis: Linear Sweep Voltammetry
Diagnostic: -

Characteristic: Unknown
Analysis: UPS, Ultraviolet Photoemission Spectroscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Substrates

Silicon

Notes

956