Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

TEMATi, (EtMeN)4Ti, [(C2H5)(CH3)N]4Ti, Tetrakis(EthylMethylAmido) Titanium, Titanium Ethylmethylamide, CAS# 308103-54-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
2Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)