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Plasma-enhanced atomic layer deposition for plasmonic TiN

Type:
Conference Proceedings
Info:
Proc. SPIE 9919, Nanophotonic Materials XIII
Date:
2016-10-03
DOI:
http://dx.doi.org/10.1117/12.2238340

Author Information

Name Institution
Lauren M. OttoUniversity of Minnesota, Twin Cities
Aaron T. HammackLawrence Berkeley National Laboratory
Shaul AloniLawrence Berkeley National Laboratory
D. Frank OgletreeLawrence Berkeley National Laboratory
Deirdre L. OlynickLawrence Berkeley National Laboratory
Scott DhueyLawrence Berkeley National Laboratory
Bethanie J. H. StadlerUniversity of Minnesota, Twin Cities
Adam M. SchwartzbergLawrence Berkeley National Laboratory

Films

Plasma TiN

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Diagnostic: -

Substrates

Notes

946