3DMAB, TDMAB, (Me2N)3B, (CH3)2N)3B, Tris(dimethylamido)borane, CAS# 4375-83-1
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 2 record(s).
| Number | Title |
|---|---|
| 1 | Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon |
| 2 | Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon |