Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Neopentasilane, (SiH3)4Si, NPS, CAS# 15947-57-6

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane