SiCl4, Silicon Tetrachloride, CAS# 10026-04-7
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 2 record(s).
| Number | Title |
|---|---|
| 1 | Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing |
| 2 | Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD |