Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

1,3,5-Trimethyl- 1,3,5-trivinylcyclotrisilazane, CAS# 5505-72-6

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition