Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Tris(cyclopentadienyl)gadolinium, Gd(Cp)3, CAS# 1272-21-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Sub-10-nm ferroelectric Gd-doped HfO2 layers