Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

OMCTS, (CH3)2SiO-)4, OctaMethylCycloTetraSiloxane, CAS# 556-67-2

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
2Carbon content control of silicon oxycarbide film with methane containing plasma