Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

tris(dimethylamido)-(dimethylamino-2-propanolato)titanium(IV) (TDMADT), CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor