4DMASi, TDMASi, (Me2N)4Si, [(CH3)2N]4Si, Tetrakis(DiMethylAmido) Silane, Silicon Dimethylamide, CAS# 1624-01-7
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s).
| Number | Title |
|---|---|
| 1 | Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition |