Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Ti(NMe2)3(guan), tris(dimethylamido) (N,N' diisopropyl-2-dimethylamidoguanidinato) titanium, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition