TEASi, Tetrakis(EthylAmido)Silane, (EtHN)4Si , CAS# 0-0-0
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s).
| Number | Title |
|---|---|
| 1 | Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor |