Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Iron(III) t-butoxide, [Fe(OtBu)3]2, CAS# 620945-29-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition