Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Titanium(IV) methoxide, Ti(OMe)4, CAS# 992-92-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties