Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Dicobalt Hexacarbonyl Tert-ButylAcetylene (CCTBA), CAS# 56792-69-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
2Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products