Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Cyclohexene oxide, CAS# 286-20-4

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition