Hexachlorodisilane, Si2Cl6, CAS# 13465-77-5

Your search for publications using this chemistry returned 6 record(s).

Number	Title
1	Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
2	Low-Temperature Conformal Atomic Layer Deposition of SiN_x Films Using Si₂Cl₆ and NH₃ Plasma
3	Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
4	Atomic layer epitaxy of Si on Ge(100) using Si₂Cl₆ and atomic hydrogen
5	Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
6	Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride