Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

[bis(1,4-di-isopropyl-1,3-diazabutadienyl)Mn(II)], CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects