Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Y(iPrCp)3, Yttrium tris(isopropylcyclopentadienyl), CAS# 130206-63-2

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection