Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

(CpMe)2HfOMeMe, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
2Hafnia and alumina on sulphur passivated germanium