Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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PDMAT, (NMe2)5Ta, Pentakis (DiMethylAmido) Tantalum, CAS# 19824-59-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 25 record(s).

NumberTitle
1Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
2Ru thin film grown on TaN by plasma enhanced atomic layer deposition
3Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
4Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
5Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
6Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
7Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
8Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
9Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
10Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
11Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
12Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
13Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
14Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
15Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
16Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
17Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
18Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
19Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
20Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
21Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
22In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
23TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
24Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
25Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion