Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

PDMAT, (NMe2)5Ta, Pentakis (DiMethylAmido) Tantalum, CAS# 19824-59-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 25 record(s).

NumberTitle
1Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
2Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
3Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
4Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
5Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
6Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
7Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
8Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
9Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
10Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
11Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
12TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
13Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
14Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
15Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
16In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
17Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
18Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
19Ru thin film grown on TaN by plasma enhanced atomic layer deposition
20Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
21Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
22Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
23Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
24Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
25Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes