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PDMAT, (NMe2)5Ta, Pentakis (DiMethylAmido) Tantalum, CAS# 19824-59-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 25 record(s).

NumberTitle
1Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
2Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
3Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
4Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
5Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
6Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
7Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
8TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
9Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
10Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
11Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
12Ru thin film grown on TaN by plasma enhanced atomic layer deposition
13Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
14Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
15Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
16Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
17Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
18Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
19Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
20Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
21Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
22Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
23Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
24In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
25Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants