ATSB, Al(OsBu)3, Al(OCHMeEt)3, Al[OCH(CH3)C2H5]3, Aluminum tri-sec-butoxide, CAS# 2269-22-9
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s).
| Number | Title |
|---|---|
| 1 | A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films |