Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

ATSB, Al(OsBu)3, Al(OCHMeEt)3, Al[OCH(CH3)C2H5]3, Aluminum tri-sec-butoxide, CAS# 2269-22-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films