Inductively coupled plasma sources from Plasma ALD, LLC.

Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.

Contact us for more information.

Hydrogen fluoride pyridine complex, CAS# 62778-11-4

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

Number	Title
1	Comparison of AlF₃ thin films grown by thermal and plasma enhanced atomic layer deposition