Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Carbon Monoxide, CO, CAS# 630-08-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics