Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Et2InN(SiMe3)2, Et2In(HMDS), DiEthyl Indium HexaMethylDiSilazane, DiEthyl Indium Bis(trimethylsilyl)amine, Bis(trimethysilyl)amidodiethyl Indium, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition